Semiconductor
Resistivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm
The UR series automatic pressure regulators are electronic regulators with high-precision pressure sensors and ...
The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.
High speed and high accuracy inspection for blanks mask
Wide range, carbon sensor conductivity meter for high concentration. Measurement rage: 0 - 1000 mS/cm
Carbon sensor compact conductivity meter for low concentration. Measurement range: 0 - 9999 μS/cm (Sensor FS-07F), 0 - 999 μS/cm (Sensor ESH-01-L-GC5), 0 - 9999 μS/cm (Sensor ESH-1-L-GC9).
Carbon sensor conductivity meter for low concentration. Measurement range: 0 - 1000 μS/cm, 0 - 10000 μS/cm (Sensor FS-07F)
Carbon sensor resistivity meter. Measurement range: 0 - 100.0 MΩ・cm
The EC-5000 series exhaust pressure controller can maintain a consistent pressure...
Best-selling, compact baking system suitable for a range of liquid source delivery applications. Easy maintenance.
Compact process gas monitor using quadrupole mass spectrometer. Monitors trace gases, responds quickly to process shift . Easy to install and maintain.
Low running costs thanks to a compact design, plus remarkable versatility
The PE-D20 control unit integrates high frequency functions via the front panel controls.
The CA-E series are conversion adapters that can be utilized when other manufactures mass flow control systems are used with mass flow controllers and meters. Simply select the appropriate adapter for your needs.
The PE series of dedicated power sources can be used as drive power sources for mass flow controllers, meters, and auto pressure regulator as well as for dedicated display units, and supply the standard flow rate setting voltage. The series includes a lineup of models that have flow rate alarm output function, models offering 0 signals and 4 to 20mA, and models that are capable of driving up to six units.
Integrated management with an in-situ real time monitor "DIGI Series" for next-generation thin-film processes
High performance auto pressure regulator with installed pressure sensor and piezo actuator valve. Digital/Analog and DeviceNet™ communications.
High precision liquid mass flow controller using the sensor with a unique cooling method. Can control from micro-liter to ultra low flow rate.
The fast response digital flow meter using differential-pressure measurement method, response time: 100 msec ( or less than 0.8 sec when it is used in combination with a piezo valve).
For various industries. Wide range of communication, Digital/Analog, DeviceNet™, CC-Link®, PROFIBUS™ and EtherCAT®. Wide control range from 10 SCCM to 1000 SLM. All-metal.
Based on years of experience developing market leading products for cutting edge technologies , we offer a range of mass flow controllers that meet our customers needs.
Gases are used for a wide range of applications in a...
The compact vaporization system does not require carrier gas, it can be used with either a liquid or gas flow meter, allowing for easy integration for direct liquid injection.
The DU-102E and DU-103K display the flow rate output signal from mass flow controllers and meters. Matching these units to the full-scale flow rate values of mass flow controllers and meters enables direct monitoring of control and measured flow rates.
High stability measurement dissolved oxygen concentration in low concentration HF. Automatically switches between three measurement ranges from μg/L to mg/L. Measurement range : 0 - 20.00 mg/L.
High precision, wide-range dissolved ozone monitor. In-line type sensor.
This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.
The exhaust pressure controller maintains pressure within a chamber at any desired level. Equipped the high-resolution stepper motor and butterfly valve.
Support for multi-batu, single-bath, and dingle-wafer cleaning systems
Enables improved cleaning process efficiency with "high temperature chemical measurement", "stable operation" and "compact body size" to meet leading-edge process requirements.
24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes
The IR-150 is designed for real time inline concentration measurement using a Non-dispersive infrared (NDIR) method
High stability measurement H2O2 concentration. Wide range measurement, 0 - 1000 ppm / 0 - 4000 ppm / 0 - 1% / 0 - 5%
Middle range HF / HCl concentration Monitor. The sensor is highly resistant to chemicals.
Measurement range: 0 -10%
24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes
High precision flow rate measurement with one-touch operation.
High precision flow rate measurement with one-touch operation.
High precision TMAH monitor can measure the range from 0 - 3 %. Chemical resistance carbon sensor. Suitable for management of TMAH concentration in developer solution.
Enables highly stable, precise measurement of multi components chemical solution utilizing HORIBA's spectroscopic measurement technology
The digital mass flow controller for high-temperature environment, from 15 ℃ to 120 ℃. Digital/Analog communication.
A best-seller mass flow controller for high temperature environments
A best-seller mass flow meter for high temperature environments
A best-seller mass flow controller for high temperature environments
A best-seller mass flow meter for high temperature environments
High senility in-line gas monitor of SiF4 and CF4 for chamber cleaning end point monitoring in deposition process. Reduce clean time and gas usage by real-time monitoring.
Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).
Ideal for hydrofluoric acid monitoring in semiconductor manufacturing
Wide range HF concentration monitor from low to undiluted liquid. High precision measurement with auto range switching function. All PFA sensors.
Ideal for ozone fluid density control in semiconductor production processes
The HE-480H industrial conductivity meter is a high-concentration conductivity meter using a four-electrode method, with a wide measurement range of 0 - 50 S / m. It is suitable for a wide range of tasks, from managing the concentration of all types of medicinal solutions, to managing the concentration of liquid fertilizers used in hydroponic farming.
Suitable pH meter for monitoring processes and quality inspections in various industries.
Compact resistivity meter for versatile porpose. Measurement range: 0 - 100.0 MΩ・cm
High precision, wide-range KOH monitor having chemical resistance sensor. Measurement range : 0 - 20%.
Capable of large flow vaporization of hydrogen peroxide.
Automatic liquid refill system delivers chemicals directly to baking or direct liquid injection systems. Safe, efficient, and continuous supply of liquid sources.
High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.
For use in combination with Manufacturing Devices. Low-cost reticle/mask particle inspection with enhanced versatility and compactness.
The MFT-20 mass flow checker is a useful tool for equipment engineers to prove a fault with a mass flow controller before removing it.
The reliable thermal sensor mass flow controller installed solenoid valve for a wide variety of industry. Wide control range from 10 SCCM to 200 SLM.
Low cost solenoid valve mfc's are suitable for flow control from 0.2sccm to 500slm N2 equivalent.
Integrate with high-performance mass flow controllers, suitable to generate homogenous gas mixtures of two or more types of gases.
High stability, compact mixed injection vaporizer system using the new vaporization method, "tornado flow". Suitable for vaporizing liquid sources pyrolyzed easily.
Vaporize liquid source stably by the gas-liquid mixture vaporization method. Can be used for low temperature and large flow production.
The best-selling digital mass flow controller offering multi range/multi gas solutions. High accuracy, fast response, and compact size. All metal.
The CS-100F4 is a new system concept that enables multipoint chemical measurement in a single unit. The CS-100F4 further expands HORIBA’s CS series lineup, which is known for its high-precision concentration monitoring of the...
The DS-3 is a compact display and settings unit for mass flow controllers (DIN 48 × 48 mm). It displays both the actual flow rate value and the flow rate setting value simultaneously, and is equipped with a conversion factor value setting and valve control function (control condition settings: fully open/fully closed). It can also communicate digitally with digital mass flow controllers.
Emission analysis type end-point monitor intended for end-point detection or plasma condition control in the plasma-based semiconductor thin-film process.
This multi-function control unit is equipped with a program setting function, preset function, and integrating function. The front panel simplifies operation.
The fast response piezo actuator valves are equipped with metal diaphragms and metal O-rings.
Excellent Plasma Control over Reactive Sputtering.
The superb feedback control of the reactive gas flow in a reactive sputtering process helps you enhance product quality and achieve greater productivity by monitoring the plasma generated by sputtering or the voltage of the power supply for the sputtering process.
HORIBA's Award Winning Fluid Delivery System (FDM Series) has revolutionised the POCl3 diffusion process by developing a system to automatically deliver bulk liquid POCl3. This Auto Refill System achieves higher uptime, cost reduction, improved process stability and higher safety.
SI-traceable standard mixed materials,Securing SI traceability of all organic/inorganic standard materials represented by CxHyOz,Ensure calibration by different standard materials from analytes
High performance thermal sensor pressure insensitive mass flow module installed with piezo actuator valve. High reliability and all metal.
The leading-edge, high performance pressure insensitive mass flow module installed with the differential pressure detection and the piezo actuator valve. Multi range/gas/pressure solution and G-LIFE Self-Diagnosis function.
Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching/coating process.Interference occurs when monochromatic light hits the sample surface, resulting in...
Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching/coating process.
Achieves dramatic cost reductions in advanced mask inspections
High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.
High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices
The SC series consists of signal cables that connect mass flow controller and meters to control units. The SC series includes a serge provision by a shield cables. Simply select the appropriate adapter for your needs.
Low cost solenoid valve mfc's are suitable for flow control from 0.2sccm to 500slm N2 equivalent.
High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices
Chemicals soulution concentration monitor has a compact profile, support for multi-bath, single-bath, and dingle-wafer cleaning systems
Dedicated power source: These setting units convert the standard flow rate setting voltage input (+5 VDC) to the desired type of flow rate and pressure setting signal and input that to the controller.
We offer the flexible system which can meet your applications, e.g. for evaluating the performance of various kinds of gas sensors, for generating simulated gases for evaluating catalysts.
The thermal flow splitter FS-3000 series is a gas distribution unit that enables precise supply control.
Recognizing a market need for a device that has both EtherCAT® connectivity and a user-adjustable response, HORIBA has introduced the Z707S Series.
Based on the successful Z700 Pressure Insensitive model, the Z707S offers users...
HE-960TM offers High precision measurement of the conductivity of TMAH (Tetra Methyl Ammonium Hydroxide) solutions.
TMAH/H2O2 Monitor, CS-139E - High-speed response and compact chemical solution concentration monitor
High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices