Application
Semiconductor & FPD
Manufacturing Process Control
Simultaneous Measurement and Simultaneous Output of Resistivity in 2 Locations Employs Chemical-Resistant Sensor
ACTIVA-M, a bronze award winner for best new product at Pittcon 2007 as Master in multi-line analysis by ICP-OES, combines superb instrumental performance with innovative and interactive assistance software tools.
ACTIVA-S maintains the Strengths of HORIBA Scientific ICP-OES Spectrometers while incorporating advanced CCD technology, thus offering Simplicity in a high performance Spectrometer.
Visualize your sample and measure thin film thickness and optical constants in seconds.
"With Auto SE, routine work will never be the same!"
NEW NIR Extended Spectral Range !
The UR series automatic pressure regulators are electronic regulators with high-precision pressure sensors and ...
The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.
Applicable to Single-Bath Cleaning systems Glass Carbon Sensor offers superior Resistance to Chemicals
The EC-5000 series exhaust pressure controller can maintain a consistent pressure...
Inline multi-monitoring. Support for multi-bath, single-bath, and single wafer cleaning system.
Compact baking system suitable for a range of liquid source delivery applications.