Gas Concentration Monitor

In-line, compact Vapor Concentration Monitor enables MOCVD precursor delivery to be stable, resulting in improved performance and device yield

With the evolution of increasingly fine film deposition processes in semiconductor manufacturing, a frowing emphasis has been placed on maintaning a clean environment within the chamber after wafer film deposition as a means of increasing productivity.

Suitable for semiconductor and FPD processes. The compact design makes it easy to maneuver, allowing it to be used for a wide range of applications. New line of single and dual cell gas analyzers