Plasma Profiling TOFMS™ - Discover a Whole New World of Information

This new instrumentation combines the speed of the GD plasma sputtering process with the rapidity and sensitivity of a Time of Flight Mass Spectrometer. Following a research phase conducted during a EU project (www.emdpa.eu), the instrument will be available from 2012 but prototypes are already available at HORIBA Jobin Yvon for demonstration.

The Plasma Profiling TOFMS offers higher sensitivity than GD OES and provides isotopic and molecular profiles.

3D Metal™ with CCD technology

Dedicated to the metal industry and capable of bulk analysis of metals and depth profile of thick layers (heat treatment, Zn coatings, electroplating) the 3D Metal will be available from end of 2011 but prototypes are already available at HORIBA Jobin Yvon for demonstration and the instrument will be exhibited at GIFA.