Chemical Analysis (Wet Process)
Inline multi-monitoring. Support for multi-bath, single-bath, and single wafer cleaning system.
High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.
High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices
High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices
The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.
24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes
24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes
High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices
Ideal for hydrofluoric acid monitoring in semiconductor manufacturing
Ideal for ozone fluid density control in semiconductor production processes
This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.
Featuring the world's first sensor with a unique cooling method, the LF-F and LV-F series can measure and control chemicals which can not be measured by thermal sensors which heat the liquid.
Enables management of hydrofluoric concentrations in diluted sulfuric acid and hydrogen peroxide at the ppm level.
Simultaneous Measurement and Simultaneous Output of Resistivity in 2 Locations Employs Chemical-Resistant Sensor
Applicable to Single-Bath Cleaning systems Glass Carbon Sensor offers superior Resistance to Chemicals
The HE-480R industrial resistivity meter features the high-precision temperature compensation function.
Its high-performance temperature compensation makes it ideal for sequential monitoring of ultra-pure water used in manufacturing processes in the semiconductor field, and many other fields, including the areas of electrical goods, foods and medicines.
The HE-480H industrial conductivity meter is a high-concentration conductivity meter with a wide measurement range.
The HE-480C industrial conductivity meter is a low-concentration conductivity meter using a two-electrode method.
This is a highly functional model, with high-performance temperature compensation, and is applicable to a wide range of tasks, from managing pure water for use with semiconductors, to managing the quality of boiler water.
High Precision Measurement of Low-Concentration Hydrofluoric Acid, Hydrochloric Acid and Ammonia