
Semiconductors
The following analytical and instrumental techniques are used in Semiconductors, please click on the squares for further information.
Alloy Composition, Bandgap | ||||||
Bandgap, PLE / PL | ||||||
Compound Alloys | ||||||
Contamination | ||||||
Crystallinity (Silicon) | ||||||
Doping Effects | ||||||
Ferroelectric Thin Films | ||||||
Fluorescence Spectra of CdSe Nanoparticles | ||||||
Hetero-Structures | ||||||
High, Low k Materials | ||||||
Analysis of Multilayer Structures on Silicon | ||||||
ONO Film | ||||||
Optical Properties | ||||||
Oxidized Porous Silicon | ||||||
Photoluminescence | ||||||
Plasma Etch End Point | ||||||
Process Chemicals e.g. Pure Water, H2SO4, H3PO4, HCl, HNO3, NH3, Photo-resist | ||||||
Porous Silicon | ||||||
Quality Control Materials for Wafer Manufacturing | ||||||
Quantitative Analysis of BPSG on Silicon | ||||||
Raw Materials for Trace Elements | ||||||
SOI Film | ||||||
Stress / Strain | ||||||
Super Lattice Structure and Defect Investigations | ||||||
Superconductor | ||||||
Thickness (Monolayer, Multi-Layers, Native Oxide, Roughness, Interface) | ||||||
Thin Film Transistors, MOSFET, OTFT | ||||||
Uniformity over Film Area and Depth |






