Comprehensive Particle Detection for Semiconductor and FPD Manufacturing Processes
HORIBA's PD Series is focused toward providing the particle detection support required for next-generation semiconductor and FPD manufacturing processes. The PD Series' great versatility, based on its outstanding detection capabilities, makes it ideal for handling mask production as well as exposure and wafer manufacturing processes.
Complementing HORIBA's HAZE-resistant monitors, the PD line-up offers models specifically for leading-edge masking processes plus compact, low-cost models. In addition, the range has now been enhanced with the introduction of new particle removal systems.
Particle Detection
Ultra sensitive detection down to 0.35 µm, suitable for detection of chrome, glass and pellicle surfaces
Ultra sensitive detection down to 0.35um. Efficiently provides particle detection with high throughput
Wide Ranging Applications, Compact and Low Operating Cost
Compact, low operating cost, and wide ranging applications, suitable for detection of both glass, chrome and pellicle surfaces.
Automatically removes particles by blow and vacuum suctionAutomatically removes particles from the reticle/mask by air (or N2) blow and vacuum suction. Removal of particles by routine use before lithography process extends...
- 1