• Skip to navigation
  • Skip to content
  • Home
  • About HORIBA
  • Investor Relations
  • Corporate News
  • Publications
  • Social Responsibility
  • Careers
  • Contact Us
HORIBA
Country/Region Selection
Deutschland | Germany
Site search
  • Automotive Test Systems
  • Process & Environmental
  • Medical
  • Semiconductor
  • Scientific
  • All Segment Product Browser
  • Products
  • News & Events
  • About Us
  • Employment
  • Product Lines
  • Processes
  • Measuring Object
  • Measurement Method
    • Absorption spectroscopic method
    • Glass electrode method
    • Conductivity measurement and
      concentration conversion
    • Electromagnetic induction method
    • Fluoride ion electrode method
    • 2-electrode method
    • 4-electrode method
    • Laser scattering method
    • Molybdenum blue method and
      absorptiometric method
    • Blowing method
    • FTIR
    • CRDS
    • NDIR
    • Spectroscopic ellipsometry
    • Optical interferometric method
    • Plasma emission analysis method
    • Quadrupole mass spectrometry
    • Mass flow measurement
      Differential pressure detection method
    • Mass flow measurement
      Thermal sensor method
    • Soap film detection method
  • Product Name
Home » Semiconductor » Products » Measurement Method » Spectroscopic ellipsometry

Spectroscopic ellipsometry

Spectroscopic ellipsometry
AutoSE

Auto SE - Simple Thin Film measurement tool!

Visualize your sample and measure thin film thickness and optical constants in seconds.

"With Auto SE, routine work will never be the same!"

NEW NIR Extended Spectral Range !

UVISEL - Spectroscopic Ellipsometer VUV to NIR: 145 to 2100 nm

Products: UVISEL VIS: 210-880 nm | UVISEL FUV: 190-880 nm | UVISEL NIR: 245-2100 nm | UVISEL ER: 190-2100 nm | UVISEL VUV: 145-880 nm

Measure thin film thickness and optical constants. For research and process development.

© 1996-2012 HORIBA, Ltd. All rights reserved.
  • Terms & Conditions
  • Privacy Policy
  • Accessibility
  • Sitemap
  • Search