• Skip to navigation
  • Skip to content
  • Home
  • About HORIBA
  • Investor Relations
  • Corporate News
  • Publications
  • Social Responsibility
  • Careers
  • Contact Us
HORIBA
Country/Region Selection
Deutschland | Germany
Site search
  • Automotive Test Systems
  • Process & Environmental
  • Medical
  • Semiconductor
  • Scientific
  • All Segment Product Browser
  • Products
  • News & Events
  • About Us
  • Employment
  • Product Lines
  • Processes
    • Semiconductor Process
    • FPD Process
      • DI Water Analysis (Wet Process)
      • Material Analysis
        (Particulates Analysis & Defect Analysis)
      • Chemical Analysis (Wet Process)
      • Gas Control/Analysis (Dry Process)
      • Process Monitoring (Dry Process)
      • Plasma Process Control
      • Drain Water Analysis
      • Thin Film Analysis
    • Photovoltaic Process
  • Measuring Object
  • Measurement Method
  • Product Name
Home » Semiconductor » Products » Processes » FPD Process » Thin Film Analysis

Thin Film Analysis

Thin Film Analysis

UVISEL

Products: UVISEL VIS: 210-880 nm | UVISEL FUV: 190-880 nm | UVISEL NIR: 245-2100 nm | UVISEL ER: 190-2100 nm | UVISEL VUV: 145-880 nm

Measure thin film thickness and optical constants. For research and process development.

© 1996-2012 HORIBA, Ltd. All rights reserved.
  • Terms & Conditions
  • Privacy Policy
  • Accessibility
  • Sitemap
  • Search