High Precision TMAH Concentration Monitor HE-960H-TM-S

High Precision TMAH Concentration Monitor HE-960H-TM-S

Overview

Accurately measures the concentration of TMAH (Tetra Methyl Ammonium Hydroxide), which is the main component of the photoresist developer solutions in semiconductor manufacturing. Repeatability: within +/- 0.003%. Measurement range : 0 - 3 %. Have the chemical resistant carbon sensor.

Features

  • High precision. Repeatability: within +/- 0.003%.
  • Wide range measurement
        Concentration: 0 - 3%, Conductivity: 0 - 1000 mS/cm
  • Automatic display range switching
  • Enables three types of measurement: TMAH concentration, conductivity, and temperature
  • Chemical resistant carbon sensor
  • 24 V DC power supply
  • RoHS compliant

Manufactured by HORIBA Advanced Techno

Specifications

Model name

HE-960H-TM-S

Target of measurement

TMAH

Measurement range

Concentration: 0 - 3%, Conductivity: 0 - 1000mS/cm

Repeatability

Within +/- 0.003wt% (Temperature variation less than +/- 0.5℃, using equivalent input for conductivity)

Linearity

Within +/- 0.003wt% (Using equivalent input for conductivity)

Transmission output

Number of output: 4

Contact output

Outputs: 5 points

Communication output

RS-485

Power supply

24V DC +/- 10% 10W

Compatible sensor

FES-510 Series

Wetted material of sensor

GC, PFA, Karletz®

Schematics

Dimensions of HE-960H-TMAH

Downloads

  • Technical Article

Conductivity Meter with Carbon Electrodes and Application for Densitometers Technologies for a Practical Densitometer (1.8MB)

Abstract
"2-pole electrical conductivity sensors with chemical resistant carbon electrodes are developed in 2002. These sensors are installed in the semiconductor wet process and used as a densitometer practically. The electrical circuit for 4-pole measurement was an innovation which improved the interface problem to the any 4-pole sensors. Single component concentration of HF or TMAH is measured from the conductivity, based on the precise measurement of conductivity and temperature, via individual temperature compensation of conductivity. Etching or developing solution should be controlled severely. Needs for monitoring solution based on the application of conductivity method are increased."