Research and Testing Laboratories

The applications:

Determination of pH as Quality Control Test in Culture Media
Determination of pH as Quality Control Test in Culture Media-01
GDOES, the Analytical Companion Tool for Magnetron Sputtering Deposition
Magnetron sputtering
Pulsed RF GDOES is a companion analytical tool for magnetron sputtering deposition. Magnetron sputtering is a type of Plasma Vapour Deposition. The vacuum chamber of the PVD coating machine is filled with an inert gas, such as argon. By applying a high voltage (RF, HIPIMS etc), a glow discharge is created, resulting in acceleration of ions to the target surface and a plasma coating. The argon-ions will eject sputtering materials from the target surface (sputtering), resulting in a sputtered coating layer on the products in front of the target.
Gas Mass Flow Control and Measurement in Research and Testing Laboratories
Testing and Laboratories
Liquid Source Vaporization and Supply in Research and Testing Laboratories
Testing and Laboratories
Test Gas Generation in Research and Testing Laboratories
Test Gas Generation
H&D Measurement of Hydrogen (and Deuterium) by RF GDOES
Measurement of Hydrogen (and Deuterium) by RF GDOES
RF GD OES is well known for ultra fast elemental depth profile of thin and thick films. All elements can be measured including Hydrogen (H) which is important in many application fields - for corrosion studies, for PV, in metallurgy, for the development of hydrogen storage materials and for all polymeric coatings studies to name a few. The most sensitive emission line for H is in the VUV range at 121,567 nm.

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