Ideal for hydrofluoric acid monitoring in semiconductor manufacturing Hydrofluoric Acid Monitor CM-200A/210A

Hydrofluoric Acid Monitor CM-200A/210A

The CM-200A/210A hydrofluoric acid monitors have been developed specifically to meet the stringent demands of semiconductor manufacturing.  The CM-200A/210A provides a real time read-out of hydrofluoric acid concentration by measuring the electric conductivity of the sample solution.  These superior units offer high repeatability even at low concentrations.  The CM-200A/210A can be used for a variety of purposes ranging from monitoring etched wafer cleaning processes to any other industrial application of  hydrofluoric acid.

 

Segment: Semiconductor
Division: Wet Process Control
Base product
Manufacturing Company: HORIBA Advanced Techno Co. Ltd.

 

  • Real-time display
    The unit determines hydrofluoric acid concentration by measuring the electric conductivity of the solution.  The concentration is then determined by comparison to the values on the calibration curve.
  • High accuracy even at the low concentrations used for semiconductor manufacturing
    The CM-200A/210A feature a 0-1/2/5/10/20/50 mass% range, which allows the units to be employed for virtually any process used in semiconductor manufacturing.  Even in the 0-1 mass% range, the units boast a repeatability of +/-2% F.S. This means that the CM-200A/210A is effective even for controlling low concentration ghydrofluoric acid baths such as those used in the latest  memory production lines.
  • Sensor designed for stable measurement
    The CM-200A/210A feature sensors molded entirely of PFA resin.  This eliminated the danger of the solution affecting metal parts, or of metal ions or other impurities leaking into the sample solution.
  • Upper/lower limit alarm
    If the hydrofluoric concentration of the solution is outside the specified range, a feedback signal is generated. The system indicates if the feedback occurred due to the concentration crossing the lowest(L-low), lower(Low), upper(High), or highest(H-high) limit.  This advanced system helps prevent the production of bad lots due to mistaken injection of hydrofluoric solution.
  • Appropriate for a variety of uses
    The CM-200A/210A are equipped with DIN size conversion units.  These small, lightweight units are perfect for use with hydrofluoric acid dilution units, hidrofluoric acid supply units, and wafer cleaning equipment.  The CM-200A's sensor is placed directly into the solution.  The CM-210A's sensor is designed for placement in the piping of the circulation loop.  Simply choose the appropriate model for the desired use.

 

 

Model

Hydrofluoric acid concentration monitor

Type

 

CM-200A: Dip type sensor
CM-210A: Flow type sensor

Principle of measurement

Conductivity measuring method by electromagnetic induction

Measurable range

 

Any single range of the ranges below
HF: 0 to 1/2/5/10/20/50 mass%
Conductivity: 0 to 100/200/500/1000 mS/cm.
Optional range(depending on specifications)

Repeatability

Within +/-2% of full scale

Stability

Within +/-2% of full scale/day

Response time

90% response: within 5 seconds

External output

 

Serial communication: RS-232C
HF concentration output; 4mA to 20mA DC(Insulation output), maximum load resistance 500Ω
Concentration alarm output; High, Low(No-voltage c-contract)
H-High, L-Low(No-voltage a-contract)
Error output(Opens when an error occurs)
Contact rating 30V DC, 0.2A

Power

 

AC power model: 100V to 230V AC+/-10%, 50Hz/60Hz, 8VA
DC power model: 24V DC +/-10%, 3W

Condition of sample water

Temperature: 10℃ to 40℃(Standard temperature 25℃)
Pressure: Dip type : 0 MPa to 0.02 MPa
Flow type: 0 MPa to 0.1 MPa

Ambient conditions

 

Temperature: 5℃ to 35℃
Humidity: Less than 80%

Semiconductor BEOL CMP in Semiconductor Manufacturing Process
Semiconductor BEOL CMP in Semiconductor Manufacturing Process

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