Lithography Process

Ultra sensitive detection down to 0.35um. Efficiently provides particle detection with high throughput

Ultra sensitive detection down to 0.35 µm, suitable for detection of chrome, glass and pellicle surfaces

Wide Ranging Applications, Compact and Low Operating Cost

Compact, low operating cost, and wide ranging applications, suitable for detection of both glass, chrome and pellicle surfaces.

Automatically removes particles by blow and vacuum suctionAutomatically removes particles from the reticle/mask by air (or N2) blow and vacuum suction.  Removal of particles by routine use before lithography process extends...