Dry Process Monitoring

Semiconductor devices, Flat Panel Displays and Photo Voltaic cells remain at the cutting edge of technology. HORIBA has many years experience in this high-tech field. HORIBA instrumentation is used to measure the chamber conditions for example to monitor plasma to detect the end point in an etching process. The instrumentation is also widely used in gas analysis in a variety of applications from inline to offline and from high concentration to parts per trillion levels.

 

Compact Process Gas Monitor MICROPOLE System

Compact process gas monitor using quadrupole mass spectrometer. Monitors trace gases, responds quickly to process shift . Easy to install and maintain.

IPA Concentration Monitor IR-150AS

The IR-150 is designed for real time inline concentration measurement using a Non-dispersive infrared (NDIR) method

Appearance of DigiCPMJ

Integrated management with an in-situ real time monitor "DIGI Series" for next-generation thin-film processes