BHF monitor image

The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.

Fiber Optic Type Chemical Concentration Monitor CS-100F1 Series

Support for multi-batu, single-bath, and dingle-wafer cleaning systems

FPM Monitor / CS-153

24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes

CS-153N HF/HNO3 Monitor

24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes

Standard Clean 1 (SC-1) chemical concentration monitor image

High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.

Appearance of CS-152, SC-2 monitor

High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices

SPM Monitor image

High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices

CS Series Monitors

High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices