UVISEL Plus In-Situ Spectroscopic Ellipsometer

Overview

In-situ spectroscopic ellipsometer for real-time thin film monitoring

The UVISEL Plus in-situ spectroscopic ellipsometer can be easily mounted on process chambers (PECVD, MOCVD, sputter, evaporation, ALD, MBE) for the real-time control of thin film deposition or etch processes.

The UVISEL Plus in-situ provides the unique combinations of very high speed, sensitivity, dynamic range and accuracy making the instrument able to control deposition / etch at the atomic layer thickness level, even for rapid processes.

Using our new adaptation kit it is possible to use the same ellipsometer for in-situ and benchtop application on a goniometer. Switching between the two configurations and aligning the system is extremely straightforward.

The UVISEL Plus in-situ ellipsometer is driven by the DeltaPsi2 software platform that is common to all HORIBA Jobin Yvon thin film metrology tools. The software provides real-time data acquisition and modelling / reprocessing capabilities. Advanced communication protocols including TCP/IP and RS232 have been designed for production environments and OEM needs.

Features

  • Highest speed and accuracy
  • Fully integrated software package for real-time measurement, modelling and reporting
  • Easy switch between in-situ and ex-situ configurations

Obtained information

  • Thin film thickness
  • Optical constants (n,k)
  • Material composition

Manufactured by HORIBA Scientific

Specifications

  • Spectral ranges: 190-920 nm - 190-2100 nm
  • Light source: 75W Xe lamp or 150W Xe lamp
  • Detection: Single point or real-time spectral acquisition using high sensitivity, wide dynamic range PMT detectors or scanning monochromator for in-situ measurement in working environment for thin film deposition/etch control
  • Spot size @300: 50μm , 100μm & 1mm
  • Mechanical adaptation: CF35 or KF40 Flange