HORIBA is one of the world's largest gas and liquid mass flow controller manufacturers, with a range of analogue, digital and high temperature mass flow controllers along with the point of use liquid source vaporization control and delivery systems.

HORIBA can deliver the critical control needed for the success in your coating industry manufacturing lines such as Chemical vapour deposition (CVD), Atomic layer deposition (ALD), metal organic chemical vapour deposition (MOCVD), PVD (physical vapour deposition), Plasma enhanced chemical vapour deposition (PECVD) and Diamond layer or Diamond layer coating (DLC). We offer a comprehensive range of fluid control and process monitoring to improve yield, increase throughput and add value to your Coating Process.

HORIBA has one of the world’s smallest quadrupole mass spectrometers allowing it to operate at a much higher pressures (1 Pa) than the larger traditional systems. This results in a reduction in the need for additional pumping equipment.

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Related Products

Mass Flow Meters / Controllers

Digital Mass Flow Controller SEC-N100 Series

For various industries. Wide range of communication, Digital/Analog, DeviceNet™, CC-Link, and PROFIBUS™. Wide control range from 10 SCCM to 1000 SLM. All-metal.

Pressure Insensitive Mass Flow Module D500

The leading-edge, high performance pressure insensitive mass flow module installed with the differential pressure detection and the piezo actuator valve. Multi range/gas/pressure solution and G-LIFE Self-Diagnosis function.

High Temperature Digital Mass Flow Controller SEC-8000 F/D Series

The digital mass flow controller for high-temperature environment, from 15 ℃ to 120 ℃. Digital/Analog communication.

Compact Process Gas Monitor

Compact Process Gas Monitor MICROPOLE System

Compact process gas monitor using quadrupole mass spectrometer. Monitors trace gases, responds quickly to process shift . Easy to install and maintain.

Plasma Emission Controller

Plasma Emission Controller RU-1000

Excellent Plasma Control over Reactive Sputtering.

The superb feedback control of the reactive gas flow in a reactive sputtering process helps you enhance product quality and achieve greater productivity by monitoring the plasma generated by sputtering or the voltage of the power supply for the sputtering process.