Crystalline Silicon production process and HORIBA's products supporting this process.

Crystaline Silicon Impurity Control Material Analysis DI Water Analysis/Waste Water Monitoring Film Deposition Process Control/Thin Film Analysis Fluid Control Chemical Solution Monitoring

Related Products

Below you can see the different stages during the Cyrstalline Silicon production process. Please click on each phase in order to see the products that are available to you during this stage.

EMGA-930-image

EMGA-930 is a simultaneous Oxygen/Nitrogen/Hydrogen Analyzer with high accuracy and repeatability suited to advanced R&D as well as quality control. It determines the O/N/H contained in ferrous and non-ferrous metals, ceramics, new materials, electronic materials and other inorganic materials using the inert gas fusion method.

High Performance Model: EMIA-Expert

For expert analyst demanding the greatest accuracy and precision

 

EMAX ENERGY EX-250/350/450

EMAX ENERGY combined with SEM is an energy dispersive X-ray analyzer which is suited for foreign material and composition analysis. It matches the samples in many applications.

Analyzer is designed to provide pertinent...

Ultima Expert

The Ultima Expert is specially designed to handle the most challenging applications and offers the highest performance on the market with unrivaled resolution, high sensitivity and unique stability.

XGT-7200

Single point analysis and automated hyperspectral imaging.

Dual vacuum modes.

Spot sizes from 1.2 mm to 10 µm.

EMAX ENERGY EX-250/350/450

EMAX ENERGY combined with SEM is an energy dispersive X-ray analyzer which is suited for foreign material and composition analysis. It matches the samples in many applications.

Analyzer is designed to provide pertinent...

LabRAM HR Evolution Raman Microscope

High spectral resolution analytical Raman microscope for ultimate performance and flexibility; includes UV Raman configuration, full automation and wide range of accessories.

PHOTOLUMINOR-D

Silicon crystal is widely used in semiconductors. The PHOTOLUMINOR-D has been designed especially for quantitative impurity analysis of silicon crystals with high sensitivity.

The application of photoluminescence for the quality...

XGT-7200

Single point analysis and automated hyperspectral imaging.

Dual vacuum modes.

Spot sizes from 1.2 mm to 10 µm.

2-channel Carbon Sensor Resistivity Meter HE-960RW-GC(W)

Resistivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm

Automatic COD Monitor CODA-500

CODA-500: High-Performance Automatic CODMN Monitor Created Through Advanced Technology and More Than 30 Years of Accumulated Expertise

Dissolved Oxygen Monitor SD-300

Ever-increasing semiconductor circuit densities require higher-quality ultra-pure water for cleaning wafers.

Minute DO (dissolved oxygen) in ultra-pure water oxygenates the wafer surfaces. To ensure high-quality ultra-pure water, DO levels must be strictly controlled. Horiba's SD-300 DO Monitor is the solution.

Created utilizing Horiba's semiconductor technologies, it provides effective high-quality, pure-water management. The SD-300 DO Monitor is lightweight and portable. It can be carried anywhere, enabling high-precision measurement of DO levels in ultra-pure water in the semiconductor industry.

2 channel Sanitary conductivity meter HE-960CW product photo

Measures the conductivity ranging from purified water up to 2000 µS/cm for pharmaceuticals, food, and cosmetics applications

Highly Sensitive Silica Monitor SLIA-300

Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).

Product Image

The IF-250 Simple Fluoride Ion Monitor for use in industry provides continuous measurements of the free fluoride ion concentration in waste water and other test samples using the fluoride ion electrode method.

The unit can be used on a range of test samples with varying concentrations from 0.0 to 10.0 mg / L up to 0 to 10,000 mg / L. This makes the IF-250 the ideal unit for monitoring the treatment of waste water and effluent resulting from the semiconductor production process, as well as electronic and glass factories using fluoride in the production process.

A state-of-the-art model adopting 60 years of water measurement technology, which achieves a reduction in life cycle costs, and compliance with regulations and corporate compliance.

Redirecting to Chemical Concentration Monitors page

GD-Profiler

The GD-Profiler 2™ provides fast, simultaneous analysis of all elements of interest including the gases nitrogen, oxygen, hydrogen and chlorine. It is an ideal tool for thin film characterization and process studies.

Compact Process Gas Monitor MICROPOLE System

Compact process gas monitor using quadrupole mass spectrometer. Monitors trace gases, responds quickly to process shift . Easy to install and maintain.

POCl3 Auto Refill System VDM Series

HORIBA's Award Winning Fluid Delivery System (FDM Series) has revolutionised the POCl3 diffusion process by developing a system to automatically deliver bulk liquid POCl3. This Auto Refill System achieves higher uptime, cost reduction, improved process stability and higher safety.

Mixed Injection System Liquid Vaporizer MI-1000/MV-1000 Series

Vaporize liquid source stably by the gas-liquid mixture vaporization method. Can be used for low temperature and large flow production.

Liquid Auto Refill System LU Series

Automatic liquid refill system delivers chemicals directly to baking or direct liquid injection systems. Safe, efficient, and continuous supply of liquid sources.

Redirecting to Mass Flow Controllers page

Gas Concentration Monitor

Gas Monitor IR-400

High senility in-line gas monitor of SiF4 and CF4 for chamber cleaning end point monitoring in deposition process. Reduce clean time and gas usage by real-time monitoring.

Vapor Concentration Monitor IR-300

In-line compact vapor concentration monitor, enables MOCVD precursor delivery to be stable.