Semicon Taiwan 2018

HORIBA Semiconductor is exhibiting at Semicon Taiwan on the 5th, 6th and 7th September 2018 in Taipei Nangang Exhibition Center Hall. To view the products that were exhibited please see the list of products below.

Exhibited Products

Dry Process
WET Process
Chemical Solution Monitor CS-700
CS-700
Micro Volume pH Monitor UP-100
UP-100
Flat Carbon Sensor Conductivity Meter HE-960LF
HE-960LF
WET Process-Utility/ Waste Water
Benchtop pH/Water Quality Analyzer LAQUA
LAQUA
Compact Water Quality Meter LAQUAtwin
LAQUAtwin
Lithography
Reticle/Mask Particle Remover    PR-PD3EP
PR-PD3EP
Materials Development
Environmental Monitoring

Access

HORIBA Booth No: L416, 4th Floor

Address: Taipei Nangang Exhibition Center Hall 1, Taiwan

More Information

2-channel Carbon Sensor Resistivity Meter HE-960RW-GC(W)

Resistivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm

Automatic calibration function pH meter AH-151

Cleaning of pH electrode with cleaning solution and calibration with standard solution is automated, making it possible to drastically reduce maintenance work.

Capacitance Manometer VG Series

Compact all metal capacitance manometer

Compact Process Gas Monitor MICROPOLE System

Compact process gas monitor using quadrupole mass spectrometer. Monitors trace gases, responds quickly to process shift . Easy to install and maintain.

Digital Mass Flow Controller SEC-N100 Series

For various industries. Wide range of communication, Digital/Analog, DeviceNet™, CC-Link®, PROFIBUS™ and EtherCAT®. Wide control range from 10 SCCM to 1000 SLM. All-metal.

Dissolved Oxygen Meter in Low Concentration HF HD-960L

High stability measurement dissolved oxygen concentration in low concentration HF. Automatically switches between three measurement ranges from μg/L to mg/L. Measurement range : 0 - 20.00 mg/L.

GA-370 Trace Gas Monitor

GA-370 : Continuous and ultrahigh-sensitivity measurement of trace impurities (CO, CO2and CH4) in high-purity gas.

 

GD-Profiler

The GD-Profiler 2™ provides fast, simultaneous analysis of all elements of interest including the gases nitrogen, oxygen, hydrogen and chlorine. It is an ideal tool for thin film characterization and process studies.

Chemical Concentration Monitor CS-700

Enables highly stable, precise measurement of multi components chemical solution utilizing HORIBA's spectroscopic measurement technology

Gas Monitor IR-400

High senility in-line gas monitor of SiF4 and CF4 for chamber cleaning end point monitoring in deposition process. Reduce clean time and gas usage by real-time monitoring.

Highly Sensitive Silica Monitor SLIA-300

Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).

High Gloss Meter IG-410

     

  • For ultra high gloss measurement
  • Dual range gloss meter
  • Flexible use with its remote probe
  • Measuring angle 60°
  • Dual range 0-100 and 0-1000
  •  

IT-470F-H Built-in type Non-Contact Infrared Thermometer

The IT-470F-H is a built-in type, non-contact infrared thermometer with industry-leading accuracy. It contributes to improve process stabilization, for which requires high accuracy temperature measurement, such as semiconductor...

LA-960

The LA-960 uses Mie Scattering (laser diffraction) to measure particle size of suspensions or dry powders. The speed and ease-of-use of this technique makes it the popular choice for most applications.

LabRAM HR Evolution Raman Microscope

High spectral resolution analytical Raman microscope for ultimate performance and flexibility; includes UV Raman configuration, full automation and wide range of accessories.

Micro Volume pH Monitor UP-100

Visualization of chemical parameter changes using Inline pH monitor

Multi Range/Multi Gas Digital Mass Flow Controller SEC-Z500X Series

The best-selling digital mass flow controller offering multi range/multi gas solutions. High accuracy, fast response, and compact size. All metal.

Optical Emission Spectroscopy Etching End-point Monitor EV-140C

Emission analysis type end-point monitor intended for end-point detection or plasma condition control in the plasma-based semiconductor thin-film process.

Reticle/Mask Particle Remover RP-1

Automatically removes particles by blow and vacuum suction

Thermal Mass Flow Module SEC-Z700S Series

Recognizing a market need for a device that has both EtherCAT® connectivity and a user-adjustable response, HORIBA has introduced the Z707S Series.

Based on the successful Z700 Pressure Insensitive model, the Z707S offers users...

UVISEL Plus

Products: UVISEL Plus: 190-920 nm | NIR Option: 2100 nm

Measure thin film thickness and optical constants. The reference ellipsometer for research and process development.

Pressure Insensitive Mass Flow Module D500

The leading-edge, high performance pressure insensitive mass flow module installed with the differential pressure detection and the piezo actuator valve. Multi range/gas/pressure solution and G-LIFE Self-Diagnosis function.

Wafer Back Side Cooling System GR-300 Series

High stability and accuracy pressure controller for back side wafer cooling in semiconductor manufacturing, installed piezo actuator valve and pressure sensor.