High Sensitive HF Concentration Monitor in Diluted sulfuric acid / Hydrogen Peroxide HF-700

Management of hydrofluoric concentrations at the ppm level is extremely important for the solution of diluted sulfuric acid, hydrogen peroxide and a small amount of hydrofluoric acid that plays an effective role in the removal of the polymer residue following the etching process. The HF-700 stabilizes hydrofluoric concentrations on the order of ppm in diluted sulfuric acid and hydrogen peroxide to enable continuous measurement and allow effective process management.