High Sensitive HF Concentration Monitor in Diluted sulfuric acid / Hydrogen Peroxide HF-700
Overview
Management of hydrofluoric concentrations at the ppm level is extremely important for the solution of diluted sulfuric acid, hydrogen peroxide and a small amount of hydrofluoric acid that plays an effective role in the removal of the polymer residue following the etching process. The HF-700 stabilizes hydrofluoric concentrations on the order of ppm in diluted sulfuric acid and hydrogen peroxide to enable continuous measurement and allow effective process management.
Features
- Stable and continuous measurement
- Multiple measurement modes to fit the application
The standard mode / A reagent-saving mode / A continuous measurement mode / An intermittent measurement mode - Easy-to-do calibration (by sending signal)
- Easy electrode replacement
Manufactured by HORIBA Advanced Techno
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