High Sensitive HF Concentration Monitor in Diluted sulfuric acid / Hydrogen Peroxide HF-700

Overview

 

Management of hydrofluoric concentrations at the ppm level is extremely important for the solution of diluted sulfuric acid, hydrogen peroxide and a small amount of hydrofluoric acid that plays an effective role in the removal of the polymer residue following the etching process. The HF-700 stabilizes hydrofluoric concentrations on the order of ppm in diluted sulfuric acid and hydrogen peroxide to enable continuous measurement and allow effective process management.

Features

  • Stable and continuous measurement
  • Multiple measurement modes to fit the application
    The standard mode / A reagent-saving mode / A continuous measurement mode / An intermittent measurement mode
  • Easy-to-do calibration (by sending signal)
  • Easy electrode replacement

Manufactured by HORIBA Advanced Techno

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