Chemical Analysis (Wet Process) Front-end Process
Fiber Optic Type Chemical Concentration Monitor CS-100F1 Series

Support for multi-batu, single-bath, and dingle-wafer cleaning systems

Standard Clean 1 (SC-1) chemical concentration monitor image

High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.

Appearance of CS-152, SC-2 monitor

High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices

SPM Monitor image

High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices

BHF monitor image

The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.

CS-153N HF/HNO3 Monitor

24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes

FPM Monitor / CS-153

24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes

CS Series Monitors

High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices

Hydrofluoric Acid Monitor CM-200A/210A

Ideal for hydrofluoric acid monitoring in semiconductor manufacturing

In-line type Dissolved Ozone Monitor OZ-96i

Ideal for ozone fluid density control in semiconductor production processes

 

Dissolved Ozone Monitor OZ-96

This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.

 

Digital Liquid Mass Flow Meters/Controllers LF-F/LV-F series

High precision liquid mass flow controller using the sensor with a unique cooling method. Can control from micro-liter to ultra low flow rate.

2-channel Carbon Sensor Resistivity Meter HE-960RW-GC(W)

Resistivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm

Carbon Sensor Resistivity Meter HE-960R-GC(W)

Carbon sensor resistivity meter. Measurement range: 0 - 100.0 MΩ・cm

Industrial Resistivity Meter HE-480R

Compact resistivity meter for versatile porpose. Measurement range: 0 - 100.0 MΩ・cm

Industrial conductivity meter HE-480C

The HE-480C industrial conductivity meter is a low-concentration conductivity meter using a two-electrode method.

This is a highly functional model, with high-performance temperature compensation, and is applicable to a wide range of tasks, from managing pure water for use with semiconductors, to managing the quality of boiler water.

TMAH Conductivity Meter HE-960TM

HE-960TM offers High precision measurement of the conductivity of TMAH (Tetra Methyl Ammonium Hydroxide) solutions.

 

Low Concentration HF/HCl/NH3 Monitor HF-960M

High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.