DI Water Analysis (Wet Process) Wafer Fabrication Process
Highly Sensitive Silica Monitor SLIA-300

Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).

Dissolved Oxygen Monitor SD-300

Ever-increasing semiconductor circuit densities require higher-quality ultra-pure water for cleaning wafers.

Minute DO (dissolved oxygen) in ultra-pure water oxygenates the wafer surfaces. To ensure high-quality ultra-pure water, DO levels must be strictly controlled. Horiba's SD-300 DO Monitor is the solution.

Created utilizing Horiba's semiconductor technologies, it provides effective high-quality, pure-water management. The SD-300 DO Monitor is lightweight and portable. It can be carried anywhere, enabling high-precision measurement of DO levels in ultra-pure water in the semiconductor industry.

industrial resistivity meter HE-960RW

This resistivity meter is ideal for such applications as the high-precision water monitoring employed at ultra-pure water plants used in semiconductor manufacturing.

They utilize newly designed, high-precision, high-stability temperature measurement circuitry and a vastly improved temperature compensation function, an important element for measuring the resistivity of ultra-pure water.