Semiconductor Process
Material Analysis
Lithography Process
Ultra sensitive detection down to 0.35um. Efficiently provides particle detection with high throughput
Ultra sensitive detection down to 0.35 µm, suitable for detection of chrome, glass and pellicle surfaces
Wide Ranging Applications, Compact and Low Operating Cost
Compact, low operating cost, and wide ranging applications, suitable for detection of both glass, chrome and pellicle surfaces.
Automatically removes particles by blow and vacuum suctionAutomatically removes particles from the reticle/mask by air (or N2) blow and vacuum suction. Removal of particles by routine use before lithography process extends...
DI Water Analysis (Wet Process)
Satisfies the customer's demands for measuring the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb)
Ever-increasing semiconductor circuit densities require higher-quality ultra-pure water for cleaning wafers.
Minute DO (dissolved oxygen) in ultra-pure water oxygenates the wafer surfaces. To ensure high-quality ultra-pure water, DO levels must be strictly controlled. Horiba's SD-300 DO Monitor is the solution.
Created utilizing Horiba's semiconductor technologies, it provides effective high-quality, pure-water management. The SD-300 DO Monitor is lightweight and portable. It can be carried anywhere, enabling high-precision measurement of DO levels in ultra-pure water in the semiconductor industry.
Material Analysis (Particulates Analysis & Defect Analysis)
Single point analysis and automated imaging.
Atmospheric pressure analysis.
Spot sizes from 1.2 mm to 10 µm.
The GD-Profiler 2™ provides fast, simultaneous analysis of all elements of interest including the gases nitrogen, oxygen, hydrogen and chlorine. It is an ideal tool for thin film characterization and process studies.
Chemical Analysis (Wet Process)
Inline multi-monitoring. Support for multi-bath, single-bath, and single wafer cleaning system.
High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.
High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices
High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices
The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.
24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes
24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes
High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices
Ideal for hydrofluoric acid monitoring in semiconductor manufacturing
Ideal for ozone fluid density control in semiconductor production processes
This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.
Featuring the world's first sensor with a unique cooling method, the LF-F and LV-F series can measure and control chemicals which can not be measured by thermal sensors which heat the liquid.
Enables management of hydrofluoric concentrations in diluted sulfuric acid and hydrogen peroxide at the ppm level.
Simultaneous Measurement and Simultaneous Output of Resistivity in 2 Locations Employs Chemical-Resistant Sensor
Applicable to Single-Bath Cleaning systems Glass Carbon Sensor offers superior Resistance to Chemicals
The HE-480R industrial resistivity meter features the high-precision temperature compensation function.
Its high-performance temperature compensation makes it ideal for sequential monitoring of ultra-pure water used in manufacturing processes in the semiconductor field, and many other fields, including the areas of electrical goods, foods and medicines.
The HE-480H industrial conductivity meter is a high-concentration conductivity meter with a wide measurement range.
High Precision Measurement of Low-Concentration Hydrofluoric Acid, Hydrochloric Acid and Ammonia
Gas Control/Analysis (Dry Process)
Suitable for semiconductor and FPD processes. The compact design makes it easy to maneuver, allowing it to be used for a wide range of applications. New line of single and dual cell gas analyzers
The UR series automatic pressure regulators are electronic regulators with high-precision pressure sensors and ...
Compact baking system suitable for a range of liquid source delivery applications.
The compact vaporization system (VC series) does not require carrier gas, it can be used with either a liquid or gas flow meter, allowing for easy integration for direct liquid injection.
The LU series automatic liquid refill system delivers chemicals directly to baking or direct liquid injection systems. Safe, efficient, and continuous supply of liquid sources.
A best-seller mass flow controller for high temperature environments
The MI/MV series can efficiently vaporize liquids using a gas-liquid mixture that allows for complete vaporization, this in a unit not much larger than a mass flow controller.
Process Monitoring (Dry Process)
Thin Film Control/Analysis
Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching/coating process.Interference occurs when monochromatic light hits the sample surface, resulting in...
Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching/coating process.Interference occurs when monochromatic light hits the sample surface, resulting in...
This is an emission analysis type end-point monitor intended for end-point detection or plasma condition control in the plasma-based semiconductor thin-film process. The newly-developed Rapture Intensity algorithm allows accurate...
Products: UVISEL VIS: 210-880 nm | UVISEL FUV: 190-880 nm | UVISEL NIR: 245-2100 nm | UVISEL ER: 190-2100 nm | UVISEL VUV: 145-880 nm
Measure thin film thickness and optical constants. For research and process development.
CMP Process
Particle size distribution analyzers, which determine both the size of particles and their state of distribution, are used for the production control of powders in such fields as ceramics, chemistry, and foodstuffs. The LA-920,...
The LA-950 uses Mie Scattering (laser diffraction) to measure particle size of suspensions or dry powders. The speed and ease-of-use of this technique makes it the most popular for many applications.
The LB-550, using a dynamic light scattering technique, is able to measure very concentrated suspensions, up to 40% solids in many cases, over a size range of 1nm-6µm.