Discover an innovative compositional depth profiling technique

March 10, 2017


Webinar

Join us for a live webinar on Discover an innovative compositional depth profiling technique, held on Tuesday, April 4th, at 10 am and 5 pm CEST.

Register Now!

Event Overview

Plasma Profiling TOFMS (PP-TOFMS) is a novel technique for material characterization that provides ultra-fast and direct elemental composition as a function of depth. We will show you through numerous examples the potential of PP-TOFMS for the development of your thin films and devices, from growth to processing.

Key Learning Objectives

  • Become familiar with the essential characteristics of this technique (speed, sensitivity, resolution)
  • Learn how PP-TOFMS will be complementary to your current chemical profiling techniques (XPS, SIMS, SEM-EDX, RBS)
  • Demonstrate how useful PP-TOFMS can be as a quick, close-loop process tool

Who Should Attend?

  • Academic material research scientists and R&D engineers working in semiconductors, microelectronics, photonics, photovoltaics
  • Metrology managers and engineers, surface scientists, XPS, SIMS, AES users 

Presenters

 

Agnès Tempez

Agnès Tempez, PhD
Product
Manager
HORIBA Scientific

Yann Mazel

Yann Mazel
Metrology Engineer,
CEA- LETI

Emmanuel Nolot

Emmanuel
Nolot, PhD
Metrology
Leader
CEA-LETI