ULTIMA 2

High performance ICP-OES Spectrometer

The ULTIMA 2 ICP-OES spectrometer with its innovative design provides a tool that increases lab productivity not only with fast analysis times, but with less complicated methods, shorter warm up time and high performance.

The high quality optics offer the lowest detection limits combined with the best spectral resolution. Full spectrum acquisition from 120 to 800 nm is available.

• Radial viewing and Total Plasma View provides lowest detection limits in ICP-OES spectrometry.
• Unique sheath gas feature, allows continuous analysis of 30% dissolved solids.
• Continuous wavelength coverage from 160 - 800nm standard with optional extension down to 120nm for Far UV analysis of the halogen elements or the use of alternative wavelengths.
• Unmatched spectral resolution of 5 pm at <320 nm minimizes interferences, with optional grating to further improve resolution for line rich matrices such as rare earth elements, geological or precious metals.
• Patented HDD^® detection provides analysis of sub-ppb to percent level in one analysis.
• Dynamic range of up to 10 orders of magnitude using Win-IMAGE.

CLIP, save time and find easily the right line

In ICP-OES spectrometry, line-rich spectra are often observed and it is difficult to find analyte lines free of interference from all the matrix or concomitant element lines. This is especially true with matrices such as steel, tungsten, zirconium, precious metals and other complex matrices.

Usually the analyst prepares known solutions, makes profiles for each wavelength at different concentrations of the analyte and concomitant elements and finally selects a line free of interference with adequate sensitivity. This crucial step in ICP-OES method development is long and tedious. It must be conducted with great care because it can greatly influence the accuracy of the results.

HORIBA Jobin Yvon simplifies this step with CLIP (Collection of Line Intensity Profiles), which assists the analyst in the development of methods for high resolution sequential ICP-OES: no more solutions to prepare and no more profiles to acquire. The profile of each line is calculated according to the instrument’s configuration: focal length, slit combination, diffraction grating and order used. Only a few minutes are needed to select lines for every element.