UVISEL Makes Critical Applications Possible

High Sensitivity to Ultra-Thin Films and Interface

Real-time monitoring of copolymer film formed at the air/water interface. Measurements were performed at the Brewster angle and results show a thickness increase from 18 to 34 Å.

“Notice the phase modulation capability to measure ? accurately around 0 and 180°. This is mandatory for precise measurements of ultra-thin film and transparent substrate.”

Detection of a very thin interface rich in tungsten located between ITO and WOx layers

Simultaneous determination of thickness and optical constants for a very thin layer of amorphous silicon deposited on glass

Films with Low Index Contrast

Thickness and optical constant determination of a SiOx layer deposited on glass substrate

Inhomogeneous films exhibiting gradient and anisotropy

Full anti-reflective stack characterization with determination of thicknesses and graded TiO2 optical constants.

The bottom of the TiO2 film exhibits a higher refractive index than the top of the film.

“Notice the importance of the FUV spectral range to detect the gradient.”

Characterization of thickness and anisotropic optical constants of PEDOT:PSS film

“Notice the importance of the FUV spectral range to detect the anisotropy.”

Advanced Measurements: Mueller matrix and depolarization data

Phase modulated ellipsometry allows calculation of the Mueller matrix elements that are useful to characterize complicated anisotropic samples.

Measurements of depolarization data allow to determine if the sample exhibits depolarization or not. It can occur in case of incoherent reflection, roughness, scattering, inadequate spectral resolution, inhomogeneity.