Thin Film Silicon production process and HORIBA's products supporting this process.

Thin Film Silicon DI Water Analysis/Waste Water Monitoring Chemical Solution Monitoring Material Analysis Fluid Control Film Deposition Process Control/Thin Film Analysis

Related Products

Below you can see the different stages during the Thin Film Silicon production process. Please click on each phase in order to see the products that are available to you during this stage.

2-channel Carbon Sensor Resistivity Meter HE-960RW-GC(W)

Resistivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm

Automatic COD Monitor CODA-500

CODA-500: High-Performance Automatic CODMN Monitor Created Through Advanced Technology and More Than 30 Years of Accumulated Expertise

Dissolved Oxygen Monitor SD-300

Ever-increasing semiconductor circuit densities require higher-quality ultra-pure water for cleaning wafers.

Minute DO (dissolved oxygen) in ultra-pure water oxygenates the wafer surfaces. To ensure high-quality ultra-pure water, DO levels must be strictly controlled. Horiba's SD-300 DO Monitor is the solution.

Created utilizing Horiba's semiconductor technologies, it provides effective high-quality, pure-water management. The SD-300 DO Monitor is lightweight and portable. It can be carried anywhere, enabling high-precision measurement of DO levels in ultra-pure water in the semiconductor industry.

Highly Sensitive Silica Monitor SLIA-300

Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).

A state-of-the-art model adopting 60 years of water measurement technology, which achieves a reduction in life cycle costs, and compliance with regulations and corporate compliance.

Redirecting to Chemical Solution Monitoring page

GD-Profiler

The GD-Profiler 2™ provides fast, simultaneous analysis of all elements of interest including the gases nitrogen, oxygen, hydrogen and chlorine. It is an ideal tool for thin film characterization and process studies.

LabRAM HR Evolution Raman Microscope

High spectral resolution analytical Raman microscope for ultimate performance and flexibility; includes UV Raman configuration, full automation and wide range of accessories.

XGT-7200

Single point analysis and automated hyperspectral imaging.

Dual vacuum modes.

Spot sizes from 1.2 mm to 10 µm.

Compact Process Gas Monitor MICROPOLE System

Compact process gas monitor using quadrupole mass spectrometer. Monitors trace gases, responds quickly to process shift . Easy to install and maintain.

POCl3 Auto Refill System VDM Series

HORIBA's Award Winning Fluid Delivery System (FDM Series) has revolutionised the POCl3 diffusion process by developing a system to automatically deliver bulk liquid POCl3. This Auto Refill System achieves higher uptime, cost reduction, improved process stability and higher safety.

Mixed Injection System Liquid Vaporizer MI-1000/MV-1000 Series

Vaporize liquid source stably by the gas-liquid mixture vaporization method. Can be used for low temperature and large flow production.

Liquid Auto Refill System LU Series

Automatic liquid refill system delivers chemicals directly to baking or direct liquid injection systems. Safe, efficient, and continuous supply of liquid sources.

Redirecting to Mass Flow Controllers page

Gas Concentration Monitor

Gas Monitor IR-400

High senility in-line gas monitor of SiF4 and CF4 for chamber cleaning end point monitoring in deposition process. Reduce clean time and gas usage by real-time monitoring.

Vapor Concentration Monitor IR-300

In-line compact vapor concentration monitor, enables MOCVD precursor delivery to be stable.

Auto SE, Simple Thin Film Measurement Tool

Visualize your sample and measure thin film thickness and optical constants in seconds.

"With Auto SE, routine work will never be the same!"

NEW NIR Extended Spectral Range !

New Uvisel 2

The ultimate solution to every challenge in thin film measurement

Optical Emission Spectroscopy Etching End-point Monitor EV-140C

Emission analysis type end-point monitor intended for end-point detection or plasma condition control in the plasma-based semiconductor thin-film process.