Semiconductors are the key evolving components in the industry today. HORIBA has kept its sights keenly focused on this micro world. Specialists in each field; HORIBA have pursued proprietary engineering projects in a wide range of areas that include evaluation and analysis, purity of ultra-pure water, composition of liquids and gases, and more broadly, environment and safety. With our sights set clearly on the overall process, we have developed a line-up of analytical equipment, fluid control and measuring systems tailored to every stage of the semiconductor manufacturing process in response to stringent quality control requirements. In all stages, from materials evaluation through to final inspection, HORIBA products help maintain high efficiency in the manufacture of leading-edge electronics devices.

Featured Application

Non contact temperature measurement for:

  • A susceptor in a vacuum chamber
  • Liquid crystal substrate in FPD manufacturing process
  • Quartz substrate in polishing.

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Semiconductor Manufactuing Process

Related Products

Below you can see the different stages during the Semiconductor Manufacturing Process. Please click on each phase in order to see the products that are avaialble to you during this stage.

Lithography Process

HORIBA's PR-PD2 Particle Detection System

High sensitive particle detection down to 0.35µm.

PR-PD2HR Particle detection system

Achieves dramatic cost reductions in advanced mask inspections

Compact Reticle/Mask Particle Detection System PR-PD3

Low running costs thanks to a compact design, plus remarkable versatility

Reticle/Mask Particle Remover RP-1

Automatically removes particles by blow and vacuum suction

PR-PD5 Particle detection system

For use in combination with Manufacturing Devices. Low-cost reticle/mask particle inspection with enhanced versatility and compactness.

Blanks Mask Particle Detection System PR-PD2BLI

High speed and high accuracy inspection for blanks mask

DI Water Analysis

2-channel Carbon Sensor Resistivity Meter HE-960RW-GC(W)

Resistivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm

Dissolved Oxygen Monitor SD-300

Ever-increasing semiconductor circuit densities require higher-quality ultra-pure water for cleaning wafers.

Minute DO (dissolved oxygen) in ultra-pure water oxygenates the wafer surfaces. To ensure high-quality ultra-pure water, DO levels must be strictly controlled. Horiba's SD-300 DO Monitor is the solution.

Created utilizing Horiba's semiconductor technologies, it provides effective high-quality, pure-water management. The SD-300 DO Monitor is lightweight and portable. It can be carried anywhere, enabling high-precision measurement of DO levels in ultra-pure water in the semiconductor industry.

Highly Sensitive Silica Monitor SLIA-300

Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).

Material Analysis (Particulates Analysis & Defect Analysis)

GD-Profiler

The GD-Profiler 2™ provides fast, simultaneous analysis of all elements of interest including the gases nitrogen, oxygen, hydrogen and chlorine. It is an ideal tool for thin film characterization and process studies.

LabRAM HR Evolution Raman Microscope

High spectral resolution analytical Raman microscope for ultimate performance and flexibility; includes UV Raman configuration, full automation and wide range of accessories.

XGT-7200

Single point analysis and automated hyperspectral imaging.

Dual vacuum modes.

Spot sizes from 1.2 mm to 10 µm.

Redirecting to Chemical Concentration Monitors Page

Fluid Control

Gas Concentration Monitoring

Gas Monitor IR-400

High senility in-line gas monitor of SiF4 and CF4 for chamber cleaning end point monitoring in deposition process. Reduce clean time and gas usage by real-time monitoring.

Vapor Concentration Monitor IR-300

In-line compact vapor concentration monitor, enables MOCVD precursor delivery to be stable.

Process Gas Monitoring

Compact Process Gas Monitor MICROPOLE System

Compact process gas monitor using quadrupole mass spectrometer. Monitors trace gases, responds quickly to process shift . Easy to install and maintain.

Thin Film Analysis/Control

New Uvisel 2

The ultimate solution to every challenge in thin film measurement

CMP Process

LA-960

The LA-960 uses Mie Scattering (laser diffraction) to measure particle size of suspensions or dry powders. The speed and ease-of-use of this technique makes it the popular choice for most applications.

Non-Contact Temperature Measurement

IT-470F-H Built-in type Non-Contact Infrared Thermometer

The IT-470F-H is a built-in type, non-contact infrared thermometer with industry-leading accuracy. It contributes to improve process stabilization, for which requires high accuracy temperature measurement, such as semiconductor...