Gas Monitor for Chamber Cleaning End Point Monitoring IR-200

Overview

The IR-200 monitors SiF4  gas concentration in real time, and identifies the cleaning end-point based on SiF4 gas concentrations.

Features

  • Monitor SiF4 concentration up to 5000 ppm
  • Compact design
    Can be instralled into exhaust lines.
  • In addition to SiF4, can be used to measure CIF3 and other gases

Manufactured by HORIBA

Specifications

Model name

IR-200

Measurement Gas

SiF4 gas

Measurement Range

0 to 5000ppm(0 to 500Pa)

Repeatability

±1%F.S.

Cell length

30mm, 1.2 in

Response Time

30 seconds or less (T90)

Pressure Resistance

0.3MPa(A)

Gas Cell Heating Temperature

150 ℃ (Max)

Contact Material

SUS-316L、BaF2、FKM

Leak Rate

1×10-10Pa・m3/s

Fitting

NW25 Flange

Analog Output

4 to 20 mA DC

Contact Output

3 channels (ERR、High、Low)

Contact Input

1 channel for zero calibration

Power

24 V DC, 30 W (Max)

Dimension (W x H X D)

Sensor: 150×268×90mm / 3.5x5.9x10.6 in

Controller: 48×96×130mm / 1.9x3.8x5.1 in

Mass

Sensor:4.5kg / 9.9 lb

Controller:0.5kg / 1.1 lb