• Skip to navigation
  • Skip to content
  • Home
  • About HORIBA
  • Investor Relations
  • Corporate News
  • Publications
  • Social Responsibility
  • Careers
  • Contact Us
HORIBA
Country/Region Selection
United States
Site search
  • Automotive Test Systems
  • Process & Environmental
  • Medical
  • Semiconductor
  • Scientific
  • All Segment Product Browser
  • Products
  • News & Events
  • About Us
  • Employment
  • Product Lines
    • Semiconductor Manufacturing
      Process Monitor
    • Gas Concentration Monitor
    • Chemical Solution Concentration Monitor
    • Ultra-pure Water Monitor
    • Particle Detection SystemRetic
      • Reticle/Mask Particle Detection System
      • FPD Mask Particle Detection System
      • Automatic Particle Blower
    • Thin Film Analyzer
    • Mass Flow Controller
    • Liquid Source Vaporization System
    • Pressure Regulator
    • Accessories
  • Processes
  • Measuring Object
  • Measurement Method
  • Product Name
Home » Semiconductor » Products » Product Lines » Particle Detection SystemRetic » Automatic Particle Blower

Automatic Particle Blower

Automatic Particle Blower
Reticle/Mask Particle Remover RP-1

Reticle/Mask Particle Remover RP-1

Automatically removes particles by blow and vacuum suctionAutomatically removes particles from the reticle/mask by air (or N2) blow and vacuum suction.  Removal of particles by routine use before lithography process extends...

Request Information (Semi)

© 1996-2012 HORIBA, Ltd. All rights reserved.
  • Terms & Conditions
  • Privacy Policy
  • Accessibility
  • Sitemap
  • Search