Reticle/Mask Particle Detection System, PR-PD2

HORIBA's PR-PD2 Particle Detection System

Overview

The PR-PD2 Particle Detection System efficiently provides particle detection with high throughput, a major concern for semiconductor plants where performance and reliability are one of the most important requirements.
HORIBA's PD series has earned a solid reputation by offering long term dependability with high throughput. The PR-PD2 has inherited a reticle transfer system that has been proven to provide stable, high performance and superior throughput over long operating periods.
The PR-PD2 offers the most sensitive detection in the series, with signal processing that can detect particles as small as 0.35 µm.
Compatible with any stepper case, the multi-stage sorter can handle up to 10 cassettes.
Various communication protocols available to meet your needs.
As a member of the PD Series it boasts high capability over a broad range of general reticle and mask particle detection tasks, evaluating glass or pellicle surfaces with high throughput.
The PR-PD2 will prove its worth by contributing to yield improvements in any semiconductor fabrication facility

Features

  • 0.35 µm detection sensitivity, 93% detection rate.
  • Easy operation with flexible inspection menu.
  • Automatic loading of up to 10 reticles directly from reticle cases in our multi-stage sorter (depending on case type).
  • It is possible to obtain direct observations of both the reticle and mask surfaces (glass and pattern surfaces.)
  • Particles mapped on MS Windows NT, convenient data management for report production.
  • Reduce inspection errors using the New Signal Process Method.

Manufactured by HORIBA

Specifications

Principle

Polarized laser scattering method

Inspection object

Reticle/mask with or without pellicle

Detector

Photomultiplier

Light source

Argon laser 488 nm, 10 mW

Reticle/mask size

5" x 5", 6" x 6", 2.3 to 6.3 mm thickness (maximum 1/4")
Option: 3" x 5", 7" x 7", Ø7-1/4 with holder, 230 mm

Pellicle

Thickness: 0.865 to 2.85 µm (±0.2 µm)

Frame height:
Glass surface (upper): 2.5 to 4.0 mm
Pattern surface (lower): 2.5 to 6.3 mm
Frame size: Differs depend on reticle case.

Detectable particle size

Pattern surface: 0.35 µm or larger
Glass surface: 5 µm or larger
Pellicle surface: 10 µm or larger
(PSL equivalent diameter)

Detectability

Standard mode: More than 90% of 0.35 µm particles.
5-inspection integrated mode: More than 93% of 0.35 µm particles.

Particle level setting

Pattern surface: 0.25 to 10 (3 steps)
Glass surface: 1.5 to 30.0 (3 steps)
Pellicle surface: 4 to 99 (3 steps)

Inspection time

Approx. 7 min from inspection start (switch ON) to map display for two-surface inspection.
Approx. 1 min from inspection end (End switch ON) to unload.
(Area: 100 5 100 mm/High through mode)

Inspection area

Shape: Square, rectangle, circle

Area:
  5" x 5": 10 x 10 to 105 x 110 mm or  Ø10 to Ø105 mm
  6" x 6": 10 x 10 to 127 x 139 mm or  Ø10 to Ø127 mm
  7" x 7": 10 x 10 to 160 x 160 mm or  Ø10 to Ø160 mm (Option)
Actual inspection area differs with reticle support stage and pellicle size. (7", 230 mm Option)

Inspection result

LCD display:
Map: Results for the entire inspection area, and results of magnifying the main map with X-Y coordinates for particle positions.

Particle observation

LCD screen observed from top and bottom side.
Magnification: 220 x, 440 x, 1100 x (bottom side) 440 x fixed (top side)
Illumination: Bright/dark-field illumination, combined with top light.

Standard function

Automatic review (skip) function, Coordinate origin setting/rotation compensation function, Inspection center function, Map display insert/delete function, Bar code ready (Hard ware option)

Optional functions

Pellicle only inspection, Mask blank inspection, Inspection of additional substrate size, 2 way data communication (GEM or SECS2)

Dimensions

1710 (W) x 1540 (H) x 1400* (D) mm
67.3 (W) x 60.6 (H) x 55.1* (D) in.
*Maximum width including a status lamp and a duct.

Weight

Approx. 1000kg/2222 lbs

 

UTILITIES

Installation site

Clean bench: Class 10 or better
Temperature: 23±1°C

Power

200/210/220/240 V AC ±10 V (Customer specified), single phase 4k VA, 50/60 Hz

Vacuum source

Pressure difference: 8.0 x 104 Pa or more 50 L/min.