Reticle / Mask Particle Detection System, PR-PD2HR

Efficiently provides particle detection with high throughput

In semiconductor plants, where high performance and demanding functionality are required, the HORIBA PD Series' high operating rate and long-term dependability have earned it a solid reputation. Inheriting a transfer system that has proven to provide stable, high performance and superior throughput over long operating periods, the PR-PD2HR now offers the most sensitive detection in the series with exclusive signal processing that can detect particles as small as 0.35 µm.

Compatible with any stepper case, the PR-PD2HR features a multi-stage sorter that can handle up to 10 cassettes and supports a number of communication protocols. True to its colors as a member of the PD Series it boasts high capability over a broad range of general reticle and mask particle detection tasks, and goes on by being able to evaluate glass or pellicle surfaces with high throughput. The PR-PD2HR will prove its worth by contributing to yield improvements in any semiconductor fabrication facility.

Microcontaminants on the pattern can be detected as small as 0.35 µm. Detection errors can be reduced to a minimum from a special function of the reticle mask width of 1.0 µm and the line spacing pattern of 1.0 µm.

Easy operation DMS
Evaluation procedures are simple because the user can specify all inspection conditions including reticle size, inspection configuration, inspection area on surface, particle levels, and many others as well. Results are displayed in real time as they are detected in a matrix display that maps where particles are found on the substrate and indicates their size. Inspection results are stored in a database server where versatile data management software is capable of processing the results and outputting reports according to user need. Two-way communication via a LAN connection is also possible.

Provides top and bottom views of surface particles
Views can be switched between a single objective microscope lens positioned above the reticle/mask surface and any one of the four positioned below. The upper lens provides x 440 magnification, while the four below provide x 220, x 440, x 880, and x 2200. These lenses provide direct views of particles on the upper or lower surface.

Reduce inspection errors using unique Signal Processing Method
HORIBA's exclusive signal processing is able to suppress false detection down to the 1.0 µm / 1.0 µm L and S level. Pseudo-detection is further minimized through the use of a low-pass filter, which enhances pattern discrimination. This is very effective in reducing false detection on dense patterns.

Applications
Reticle and mask fabrication processes

• Measurement of particles on masks and reticle blanks.
• Measurement of particles on pattern and glass surfaces after EB lithography and cleaning processes.
• Measurement of particles on pattern, glass and pellicle surfaces after pellicle attachment.
• Measurement of particles on pellicle, alone, before attachment (optional function)

Exposure process

• In-coming QA inspection of reticles and masks.
• Routine particle measurement of reticles and masks before exposure.
• Periodic particle measurement of reticles and masks.