Absorption Spectrophotometry

The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.

This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.

Support for multi-batu, single-bath, and dingle-wafer cleaning systems

24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes

24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes

Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).

Ideal for hydrofluoric acid monitoring in semiconductor manufacturing

Ideal for ozone fluid density control in semiconductor production processes

High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.

High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices