Application
Machine Maintenance & Management
Low running costs thanks to a compact design, plus remarkable versatility
Ideal for ozone fluid density control in semiconductor production processes
High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.
For use in combination with Manufacturing Devices. Low-cost reticle/mask particle inspection with enhanced versatility and compactness.
Achieves dramatic cost reductions in advanced mask inspections
