Application
Low Concentration Type HF/HCl/NH3 Concentration Monitor HF-960M
Overview
The HF-960M uses sensors that offer outstanding corrosion resistance for high-precision, high-speed measurement of low concentrations of hydrofluoric acid, hydrochloric acid and ammonia, and is thus perfect for single-bath and wafer cleaning. The HF-960M is also an environmentally-friendly product that uses lead-free solder for mounting chips on the PCB.
Features
- Precise measurement of low HF concentrations
- 5 types of measurement available
HF, HCl & NH3 concentrations, conductivity, and temperature - The analog output range can be arbitrarily set with to the concentration measuring range
- The HF-960M provides 7 output points
- 3-channel transmission output
- RoHS compliant
- DC 24 V Power Source
- CE Marking compliant
Manufactured by HORIBA Advanced Techno
Specifications
Product name | Low Concentration Type HF / HCl / NH3 Concentration Monitor |
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Model | HF-960M |
Measurement range | HF: 0 - 5000 ppm, HCl: 0 - 5000 ppm, NH3: 0 - 10000 ppm, Conductivity:0 - 50.0 mS/cm |
Power supply | Rated voltage 24 V DC, 10 W (max) |
Structure | Iindoor-use, panel installation type, panel case : ABS, terminal : PBT, Panel : IP65 dust and water proof structure |
External dimensions | 96 (W) x 96 (H) x 115 (D) mm, Case depth : approx.105 (when panel-mounted) |
Weight | Approx. 550 g |
Conforming standards | CE marking, FCC Part15 |
Compatible sensors | FS-10F series flow-type sensor |
Downloads
- Technical Article
Abstract
"2-pole electrical conductivity sensors with chemical resistant carbon electrodes are developed in 2002. These sensors are installed in the semiconductor wet process and used as a densitometer practically. The electrical circuit for 4-pole measurement was an innovation which improved the interface problem to the any 4-pole sensors. Single component concentration of HF or TMAH is measured from the conductivity, based on the precise measurement of conductivity and temperature, via individual temperature compensation of conductivity. Etching or developing solution should be controlled severely. Needs for monitoring solution based on the application of conductivity method are increased."