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Home » Application Semiconductor & FPD Manufacturing Process Control Mask Analysis

Mask Analysis

Compact Reticle/Mask Particle Detection System PR-PD3

Compact Reticle/Mask Particle Detection System PR-PD3

Low running costs thanks to a compact design, plus remarkable versatility

PR-PD5 Particle detection system

Low-cost Reticle/Mask Particle Detection System PR-PD5

For use in combination with Manufacturing Devices. Low-cost reticle/mask particle inspection with enhanced versatility and compactness.

PR-PD2HR Particle detection system

Reticle / Mask Particle Detection System, PR-PD2HR

Achieves dramatic cost reductions in advanced mask inspections

HORIBA's PR-PD2 Particle Detection System

Reticle/Mask Particle Detection System, PR-PD2

High sensitive particle detection down to 0.35µm.

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