Materials Analysis

Pellicle Thickness Analysis

Evaluates the thickness uniformity of the next generation pellicle.

Particle Object Identification

Useful for investgating problems by analyzing foreign matter components on the reticle.

Related Products

Mais UVISEL Plus

Spectroscopic Ellipsometer from FUV to NIR: 190 to 2100 nm

XploRA Nano
Mais XploRA Nano

AFM-Raman for Physical and Chemical imaging