Semiconductor Page Heading

Thin Film Analysis

Thin Film characterization are important in the development phase of new materials to minimize the time to market of a new generation of devices and in the metrology step, which is required for improving the yield of a production line for minimizing wafer-to-wafer variation. HORIBA a leader in optical spectroscopy from deep UV to XRF offers a unique range of high-end tools for Materials and Thin Film Analysis which can used in R&DIn-Line or integrated in a process chamber.

Key Benefits:

  • Single sensor or multiple sensor platform
  • For 4”,6”, 8” and 12 “ wafer size
  • Fast measurement
  • Modular and easy customization for OEM integration
  • Global Application support.

Related Products

Mais PR-PD2

Reticle/Mask Particle Detection System

Mais PR-PD2BLI

Blanks Mask Particle Detection System

Mais PR-PD2HR

Reticle / Mask Particle Detection System

Mais PR-PD3

Compact Reticle/Mask Particle Detection System

Mais PR-PD3 BLI

Particles on Blank Mask

Mais PR-PD5

Low-cost Reticle/Mask Particle Detection System

Mais RP-1

Reticle/Mask Particle Remover

Request for Information

Do you have any questions or requests? Use this form to contact our specialists.