PR-PD3 Pro

Reticle / Mask Inspection System

After over 25 years of experience in developing photomask equipment in collaboration with key players in the semiconductor industry, HORIBA is introducing the PR-PD3 Pro : the latest members of the PD family with new innovative features addressing the concerns generated by the complexity of new devices.

Contamination Reduction

Our new handling system reduces contamination during reticle handling and inspection by minimizing contact points on the reticle to comply with SEMI Standards.

Sensitivity

The use of a high power 488 nm laser enables high sensitivity inspection of complex mask architectures.

Contamination Reduction

Our new handling system reduces contamination during reticle handling and inspection by minimizing contact points on the reticle to comply with SEMI Standards.