Plasma Profiling TOFMS
Corrosion
- Depth Profile obtained in less than 2 minutes (sample from University of Manchester)
Al2O3, Ta2O5
Analysis of aluminium oxide on Al and tantalum oxide on Ta both with 4 nm Cr and P delta layers, comparison GD TOFMS with GDOES
- I. S. Molchan, G. E. Thompson, P. Skeldon, N. Trigoulet, A. Tempez, P. Chapon, “Analysis of thin impurity-doped layers in anodic alumina and anodic tantala films by glow discharge time-of-flight mass spectrometry”, Transactions of the Institute of Metal Finishing, 88, 154-157 (2010).DOI: 10.1179/174591910X12692576434617
- A. Tempez, S. Legendre, P. Chapon, Multidimensional Depth Profile Analysis of Oxide Layers by Plasma Profiling Techniques: GD-OES and PP-TOFMS, Proc. SPIE Photonics (International Society for Optics and Photonics) SPIE 8626, Oxide-based Materials and Devices IV, 862608 (March 18, 2013).
DOI:10.1117/12.2010085
