Gas Monitor for Chamber Cleaning End Point Monitoring IR-200
Übersicht
The IR-200 monitors SiF4 gas concentration in real time, and identifies the cleaning end-point based on SiF4 gas concentrations.
Merkmale
- Monitor SiF4 concentration up to 5000 ppm
- Compact design
Can be instralled into exhaust lines. - In addition to SiF4, can be used to measure CIF3 and other gases
Hergestellt von HORIBA
Spezifikationen
Model name | IR-200 |
|---|---|
Measurement Gas | SiF4 gas |
Measurement Range | 0 to 5000ppm(0 to 500Pa) |
Repeatability | ±1%F.S. |
Cell length | 30mm, 1.2 in |
Response Time | 30 seconds or less (T90) |
Pressure Resistance | 0.3MPa(A) |
Gas Cell Heating Temperature | 150 ℃ (Max) |
Contact Material | SUS-316L、BaF2、FKM |
Leak Rate | 1×10-10Pa・m3/s |
Fitting | NW25 Flange |
Analog Output | 4 to 20 mA DC |
Contact Output | 3 channels (ERR、High、Low) |
Contact Input | 1 channel for zero calibration |
Power | 24 V DC, 30 W (Max) |
Dimension (W x H X D) | Sensor： 150×268×90mm / 3.5x5.9x10.6 in Controller： 48×96×130mm / 1.9x3.8x5.1 in |
Mass | Sensor：4.5kg / 9.9 lb Controller：0.5kg / 1.1 lb |