Chemische Konzentration Monitor
HORIBAs chemische Konzentration Monitore messen die Konzentration von verschiedenen chemischen Materialien d SC-1 , SC-2 , SPM , HF usw. in Echtzeit . Dieser Monitor kann in der Reinigungs- und Ätzprozesse in der Halbleiterherstellung verwendet werden. Unsere chemische Konzentration Monitore können bis zu acht Komponenten von Multi -Komponenten Chemikalien ( je nach Modell ) zu messen. Wir haben Monitore auch einzelne Komponente Chemikalien zu messen und sicherzustellen, dass wir Ihren Fertigungsprozess und Anlage mithalten können. Alle unsere Modelle sind sehr Genauigkeit und Stabilität. Wählen Sie aus dem Balg Line-up die beste chemische Konzentration Monitor, der Ihren Bedürfnissen entspricht.
Enables highly stable, precise measurement of multi components chemical solution utilizing HORIBA's spectroscopic measurement technology
Enables improved cleaning process efficiency with "high temperature chemical measurement", "stable operation" and "compact body size" to meet leading-edge process requirements.
Support for multi-batu, single-bath, and dingle-wafer cleaning systems
Chemicals soulution concentration monitor has a compact profile, support for multi-bath, single-bath, and dingle-wafer cleaning systems
High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.
Middle range HF / HCl concentration Monitor. The sensor is highly resistant to chemicals.
Measurement range: 0 -10%
Wide range HF concentration monitor from low to undiluted liquid. High precision measurement with auto range switching function. All PFA sensors.
KOH Monitor
High precision, wide-range KOH monitor having chemical resistance sensor. Measurement range : 0 - 20%.
TMAH Monitor
High precision TMAH monitor can measure the range from 0 - 3 %. Chemical resistance carbon sensor. Suitable for management of TMAH concentration in developer solution.
TMAH monitor can measure the wide range from 0 - 10 %. Chemical resistance carbon sensor. Suitable for management of TMAH concentration in developer solution.
High precision, wide-range dissolved ozone monitor. In-line type sensor.
High stability measurement H2O2 concentration. Wide range measurement, 0 - 1000 ppm / 0 - 4000 ppm / 0 - 1% / 0 - 5%
High stability measurement dissolved oxygen concentration in low concentration HF. Automatically switches between three measurement ranges from μg/L to mg/L. Measurement range : 0 - 20.00 mg/L.
Improved maintenance of equipment such as chillers with solvent management by monitoring deterioration of solvents
Carbon sensor resistivity meter. Measurement range: 0 - 100.0 MΩ・cm
Resistivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm
Compact resistivity meter for versatile porpose. Measurement range: 0 - 100.0 MΩ・cm
Carbon sensor compact conductivity meter for low concentration. Measurement range: 0 - 9999 μS/cm (Sensor FS-07F), 0 - 999 μS/cm (Sensor ESH-01-L-GC5), 0 - 9999 μS/cm (Sensor ESH-1-L-GC9).
Wide range, carbon sensor conductivity meter for high concentration. Measurement rage: 0 - 1000 mS/cm
Carbon sensor conductivity meter for low concentration. Measurement range: 0 - 1000 μS/cm, 0 - 10000 μS/cm (Sensor FS-07F)