
Stand-alone Type Chemical Concentration Monitor CS-100 Series
Übersicht
The CS-100 Series monitors measure in real time the concentrations of various types of chemical solutions and have the capability to control the timing of automatic chemical spiking.
Measurement is fully automatic; no measurement control is required once the measurements have begun. The operator needs only to prepare the chemical solution. In addition, air is used for the reference spectral measurements to be taken without abnormalities in the solution flow.
Merkmale
- Concentration follow-up in real-time
- Fully automatic measurements
- Comprehensive measure to eliminate air bubble during sequential measurements
Hergestellt von HORIBA Advanced Techno
Spezifikationen
Model name | CS-100 |
---|---|
Measurement principle | Absorption spectroscopic method |
Sample temperature | 20 to 30 Degree C |
Ambient temperature | 20 to 25 Degree C |
Components | Max. 4 components |
Chemical range | Max. 4 ranges |
Communication | Parallel I/O, Analog output, RS-232C |
Analog output | Max. 2 components |
Dimension | 205(W) X 329(D) X 269(H)mm |
Power source | DC 24V |
Consumable parts | Halogen lamp |
Wavelength | UV/NIR |
Wetted material | PTFE, PFA, Sapphire or Quartz |
Applikationen
- Cleaning and etching processes in semiconductor manufacturing
- Cleaning processes in photovoltaic manufacturing
- Optimize processes through continuous measurement of chemical solutions
- Reduce usage volumes by extending life of chemical solutions
- Reduce lot defects and increase product yield
Downloads
- Technical Article
Industrial In-line and Multi Component Monitor Using Absorption Spectroscopy and Its Application (1.6MB)
Abstract
"Chemical concentration monitor, HORIBA CS series, is widely used in semiconductor wet process. Its measurement principle, Ultra Violet (UV) and Near Infrared (NIR) absorption spectroscopy, enables in-line and real-time monitoring for multiple component chemistry. Measuring various kinds of samples is achieved, such as Fe ion concentration in HCl, more than 5 component chemistry including by-product from etching, to H2O2 in CMP slurry. In this paper, measurement results for those samples are introduced."