LAQUA newsletter subscription

With its new compact design and enhanced image quality, the LEM interferometer for in-situ etch rate monitoring and end-point detection can be mounted on any process chamber with a direct top view of the wafer. It provides a real-time digital CCD image of the sample surface, making its 30-m laser beam positioning simple and accurate. Based on interferometry technique, the LEM provide in-situ etch/growth rate monitoring for endpoint detection of a wide range of dry etch applications.

Informationsanfrage

Sie haben Fragen oder Wünsche? Nutzen Sie dieses Formular, um mit unseren Spezialisten in Kontakt zu treten.

* Diese Felder sind Pflichtfelder.