Webinar: Characterization of Multilayer Coatings – Composition and Thickness using Multiple Techniques

GD-OES (Glow Discharge – Optical Emission Spectroscopy) is a powerful technique for depth profile analysis (Elemental composition of layers vs Depth). It can sputter up to 150 microns depth in a matter of minutes while providing a nanometer scale in-depth resolution. Conductive and non-conductive materials can be analyzed. New innovative patented features can measure the sputter rate in real time during the sputtering, immediately providing the thickness of any layer without any calibration. However, like other optical emission spectroscopic techniques, calibration is necessary to get concentrations.

Sometimes it is not easy to find suitable reference materials for this purpose (mainly for elements as O, N, H…). By using other analytical techniques, like XRF, and elemental analyzers for C/S/O/N/H, the calibration of the depth profiles becomes easier.

This presentation will demonstrate how the combination of different bulk measurements with depth profile analysis will provide fully quantified depth profile (concentration vs depth).

We hope you can join us!