PR-PD3 Pro

PR-PD3 Pro

Reticle / Mask Inspection System

After over 25 years of experience in developing photomask equipment in collaboration with key players in the semiconductor industry, HORIBA is introducing the PR-PD3 Pro : the latest members of the PD family with new innovative features addressing the concerns generated by the complexity of new devices.

Contamination Reduction

Our new handling system reduces contamination during reticle handling and inspection by minimizing contact points on the reticle to comply with SEMI Standards.

Sensitivity

The use of a high power 488 nm laser enables high sensitivity inspection of complex mask architectures.

Contamination Reduction

Our new handling system reduces contamination during reticle handling and inspection by minimizing contact points on the reticle to comply with SEMI Standards.

Segment: Semiconductor
Abteilung: Metrology
Produktionsfirma: HORIBA, Ltd.

Auswahl an Ländern und Regionen, in denen dieses Produkt verfügbar ist:
China,Germany,Ireland,Israel,Italy,Korea (South),Malaysia,Singapore,Taiwan,United Kingdom,United States
Die komplette Liste anzeigen. hier.

  • Auto Particle Image Capture Function 

  • Auto Particle Sizing Function 

  • Pellicle Frame Proximity Inspection 

  • Enhance Particle Binning 

  • Remote Access 

Informationsanfrage

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