Thin Film Photovoltaics

PV structures characterized by Spectroscopic Ellipsometry

Spectroscopic ellipsometry is an ideal technique to characterize film thickness and optical constants and optical bandgap for photovoltaic applications. Spectroscopic ellipsometers are also sensitive to the presence if rough overlayer and graded optical constants. The technique provides the advantage to be fast, simple to operate and non-destructive for the characterization if the samples.

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Spectroscopic Ellipsometer from FUV to NIR: 190 to 2100 nm

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