Semiconductor

Metrology

HORIBA’s Particle Detection and Removal systems are essential to improve yield in the semiconductor lithography process.


Particle Detection System

HORIBA offers Systems which are widely used in the semiconductor lithography process. These systems detect particles on a reticle/mask with high reliability and long-term stability. The systems can measure particles on each glass/pellicle surface with precision and high throughput contributing to yield improvements for any semiconductor manufacturing facility. HORIBA also provide a Particle Remover that is designed to be used in conjunction with the detection system to automatically remove any particles detected.
 

Browse Products

PR-PD2
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Reticle/Mask Particle Detection System

PR-PD2BLI
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Blanks Mask Particle Detection System

PR-PD2HR
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Reticle / Mask Particle Detection System

PR-PD3
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Compact Reticle/Mask Particle Detection System

PR-PD5
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Low-cost Reticle/Mask Particle Detection System

RP-1
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Reticle/Mask Particle Remover

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