HORIBA offers Particle Detection Systems which are widely used in the semiconductor lithography process. These systems detect particles on a reticle/mask with high reliability and long-term stability. The HORIBA Particle Detection systems can measure particles on each glass/pellicle surface with precision and high throughput contributing to yield improvements for any semiconductor manufacturing facility. HORIBA also provide a Particle Remover that is designed to be used in conjunction with the Particle Detection System to automatically remove any particles detected.
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