Semiconductor

Metrology

HORIBA’s Particle Detection and Removal systems are essential to improve yield in the semiconductor lithography process.


Particle Detection System

HORIBA offers Particle Detection Systems which are widely used in the semiconductor lithography process. These systems detect particles on a reticle/mask with high reliability and long-term stability. The HORIBA Particle Detection systems can measure particles on each glass/pellicle surface with precision and high throughput contributing to yield improvements for any semiconductor manufacturing facility. HORIBA also provide a Particle Remover that is designed to be used in conjunction with the Particle Detection System to automatically remove any particles detected.
 

Browse Products

Compact Reticle/Mask Particle Detection System PR-PD3
MoreCompact Reticle/Mask Particle Detection System PR-PD3
Low-cost ReticleMask Particle Detection System PR-PD5
MoreLow-cost Reticle/Mask Particle Detection System PR-PD5
Reticle/Mask Particle Detection System PR-PD2
MorePR-PD2
Reticle/Mask Particle Detection System
Blanks Mask Particle Detection System PR-PD2BLI
MorePR-PD2BLI
Blanks Mask Particle Detection System
Reticle / Mask Particle Detection System, PR-PD2HR
MoreReticle / Mask Particle Detection System PR-PD2HR
Reticle/Mask Particle Remover RP-1
MoreReticle/Mask Particle Remover RP-1

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