2-channel High Precision HF Concentration Monitor HF-SP-CU

2-channel High Precision HF Concentration Monitor HF-SP-CU

High precision and high performance HF concentration monitor enables micro-process management with +/- 2.0 ppm (highest accuracy), high speed sampling & output, 2-channel sensors, and intra-sensor pressure correction function.
Suitable for the semiconductor finest process control.

 

Segment: Semiconductor
Division: Wet Process Control
Base product
Manufacturing Company: HORIBA Advanced Techno Co. Ltd.

 

  • High precision : +/- 2.0 ppm (highest accuracy)
  • High speed sampling & output
  • 2-channel sensors achieves the measurement of both the supply tank and chamber
  • Intra-sensor pressure correction function

 

 

Chemical Concentration Monitoring in Wet Process in Semiconductor Manufacturing Process
Chemical Concentration Monitoring in Wet Process in Semiconductor Manufacturing Process

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